Wet Etching Rate of Nickel/Iron Alloy.

Wet anisotropic etching of polyimide

With the aim of developing flexible biocompatible implants for in vivo studies of nerve regeneration [1], fabrication of passive polyimide membranes using the commercial available Kapton film (100HN and 50HN, from DuPont) was investigated. Polyimide has been widely used in microelectronics, and its application possibilities have been widening to other fields such as micromachining and biomedica...

Wet and Dry Etching Theory

Wet-Chemical Etching and Cleaning of Silicon

A Introduction Research and manufacturing related to silicon devices, circuits, and systems often relies on the wet-chemical etching of silicon wafers. The dissolution of silicon using liquid solutions is needed for deep etching and micromachining, shaping, and cleaning. Also, wet-chemistries are often used for defect delineation in single crystal silicon materials. In this paper, a review of t...

Wet Etching of Optical Thin Films

The form of etch rate minima in wet chemical anisotropic etching of silicon

Etching of monocrystalline silicon in alkaline based solutions leads to a deep minimum in the etch rate crystallographically oriented along 〈111〉. The details of the form of the minimum (angular dependence of the etch rate) are investigated and discussed in a framework of steps originating from spontaneous nucleation and from misorientation of the crystal face exposed to the etchant. As a resul...